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Proceedings Paper

Bad pixel replacement based on spatial statistics for IR sensor
Author(s): Xiang-long Meng; Wei Zhang; Ming-yu Cong; Yi-ming Cao; Wen-zhuo Bao
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Paper Abstract

IR focal plane arrays typically contain bad pixels. Bad pixels have to be corrected because those can significantly impair the performance of target-detection algorithms. On the other hand, particularly as an aid to visual interpretation, it is desirable to replace the bad pixels. IR image contains spatial information and is correlative in spatial domain. In spatial statistics the semivariogram is an important function that relates semivariance to sampling lag. This function can characterize the spatial dependence of each point on its neighbor and provide a concise and unbiased description of the scale and pattern of spatial variability. One of the main reasons for deriving semivariogram is to use it in the process of estimation. Kriging is an interpolation and estimation technique that considers both the distance and the degree of variation between known data points when estimating values in unknown areas. In this paper a new technique based on spatial statistics is developed for bad pixel replacement. The main objective of the technique is to replace bad pixels through Kriging estimation. Theory analysis and experiments show that the method is reasonable and efficient.

Paper Details

Date Published: 22 October 2010
PDF: 6 pages
Proc. SPIE 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology, 76582N (22 October 2010); doi: 10.1117/12.865587
Show Author Affiliations
Xiang-long Meng, Harbin Institute of Technology (China)
Wei Zhang, Harbin Institute of Technology (China)
Ming-yu Cong, Harbin Institute of Technology (China)
Yi-ming Cao, Harbin Institute of Technology (China)
Wen-zhuo Bao, Harbin Institute of Technology (China)


Published in SPIE Proceedings Vol. 7658:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology
Yadong Jiang; Bernard Kippelen; Junsheng Yu, Editor(s)

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