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Proceedings Paper

Design of a large area 2D microscopy image measurement system
Author(s): Xin Li; Yurong Chen; Shenghuai Wang; Tiebang Xie
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Paper Abstract

The acquisition, identification and evaluation of microscopy image is one of the most popular and important technology in basic research. The field and resolution of traditional microscopy are mutually restricted. For enlarging field, one method is to design microscopy with large numerical aperture and large field by structure. But the field can't be too large because of structure limit. The other is to stitch images. But the stitching of most microscopy is based on features of images with a low accuracy displacement mechanism. The stitching accuracy is not high and even the stitching can't be implemented because of discrimination errors. So a large area stitching image is difficult to obtain. To address this issue, a type of large area, seamless and featureless microscopy image stitching measurement system has been designed in this paper. This system is based on compound optical microscopy system and 3D precision displacement system with large travel, nanometer level and displacement measurement. A mathematic model for CCD calibration and calculation of angles between CCD and level worktables is established and the problem that the CCD calibration and angle measurement of general measurement system depend on external equipments is solved. A non-orthogonal worktable moving strategy is set up for the seamless stitching measurement of optical microscopy image measurement, which reduces the cost of stitching and enlarges the measurement field of this method. Therefore the problem of this method, which the lateral resolution and the measurement filed are restricted to the numerical aperture of objective, is solved.

Paper Details

Date Published: 11 October 2010
PDF: 6 pages
Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 765630 (11 October 2010); doi: 10.1117/12.865512
Show Author Affiliations
Xin Li, Hubei Automotive Industries Institute (China)
Yurong Chen, Hubei Automotive Industries Institute (China)
Shenghuai Wang, Hubei Automotive Industries Institute (China)
Huazhong Univ. of Science and Technology (China)
Tiebang Xie, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 7656:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Jose M. Sasian; Libin Xiang; Sandy To, Editor(s)

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