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Proceedings Paper

Relationship between influence function accuracy and polishing quality in magnetorheological finishing
Author(s): Markus Schinhaerl; Florian Schneider; Rolf Rascher; Christian Vogt; Peter Sperber
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Paper Abstract

Magnetorheological finishing is a typical commercial application of a computer-controlled polishing process in the manufacturing of precision optical surfaces. Precise knowledge of the material removal characteristic of the polishing tool (influence function) is essential for controlling the material removal on the workpiece surface by the dwell time method. Results from the testing series with magnetorheological finishing have shown that a deviation of only 5% between the actual material removal characteristic of the polishing tool and that represented by the influence function caused a considerable reduction in the polishing quality. The paper discusses reasons for inaccuracies in the influence function and the effects on the polishing quality. The generic results of this research serve for the development of improved polishing strategies, and may be used in alternative applications of computer-controlled polishing processes that quantify the material removal characteristic by influence functions.

Paper Details

Date Published: 7 October 2010
PDF: 10 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76550Y (7 October 2010); doi: 10.1117/12.865508
Show Author Affiliations
Markus Schinhaerl, Univ. of Applied Sciences Deggendorf (Germany)
Florian Schneider, Univ. of Applied Sciences Deggendorf (Germany)
Rolf Rascher, Univ. of Applied Sciences Deggendorf (Germany)
Christian Vogt, Univ. of Applied Sciences Deggendorf (Germany)
Peter Sperber, Univ. of Applied Sciences Deggendorf (Germany)


Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)

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