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Proceedings Paper

W-CMOS blanking device for projection multibeam lithography
Author(s): Michael Jurisch; Mathias Irmscher; Florian Letzkus; Stefan Eder-Kapl; Christof Klein; Hans Loeschner; Walter Piller; Elmar Platzgummer
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Paper Abstract

As the designs of future mask nodes become more and more complex the corresponding pattern writing times will rise significantly when using single beam writing tools. Projection multi-beam lithography [1] is one promising technology to enhance the throughput compared to state of the art VSB pattern generators. One key component of the projection multi-beam tool is an Aperture Plate System (APS) to form and switch thousands of individual beamlets. In our present setup a highly parallel beam is divided into 43,008 individual beamlets by a Siaperture- plate. These micrometer sized beams pass through larger openings in a blanking-plate and are individually switched on and off by applying a voltage to blanking-electrodes which are placed around the blanking-plate openings. A charged particle 200x reduction optics demagnifies the beamlet array to the substrate. The switched off beams are filtered out in the projection optics so that only the beams which are unaffected by the blanking-plate are projected to the substrate with 200x reduction. The blanking-plate is basically a CMOS device for handling the writing data. In our work the blanking-electrodes are fabricated using CMOS compatible add on processes like SiO2-etching or metal deposition and structuring. A new approach is the implementation of buried tungsten electrodes for beam blanking.

Paper Details

Date Published: 27 May 2010
PDF: 10 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 774815 (27 May 2010); doi: 10.1117/12.865478
Show Author Affiliations
Michael Jurisch, IMS Chips (Germany)
Mathias Irmscher, IMS Chips (Germany)
Florian Letzkus, IMS Chips (Germany)
Stefan Eder-Kapl, IMS Nanofabrication AG (Austria)
Christof Klein, IMS Nanofabrication AG (Austria)
Hans Loeschner, IMS Nanofabrication AG (Austria)
Walter Piller, IMS Nanofabrication AG (Austria)
Elmar Platzgummer, IMS Nanofabrication AG (Austria)


Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)

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