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Proceedings Paper

Research and design on DMD digital photolithography system
Author(s): Yufang Rao; Yiqing Gao; Ningning Luo
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Paper Abstract

As the critical dimension of chip shrinking the semiconductor industry has developed fully from deep sub-micron to the nano-dimension. In particular, entering the nano-dimension, lithography mask technology, among a variety of lithography method, has become a key technology which can be applied to determine their prospect. However, the proportions which mask cost accounted for in the costs of the entire lithography are rising. The increasing price of mask cost caused intense competition among global mask manufacturers. How to reduce mask cost and utilizing maskless lithography technology, the hot topic in lithography industry, have become an important subject for a lithography engineer to study. Based on ultraviolet light source and the digital gray-scale mask exposure technology, a new method of photolithography is proposed. First of all, we determine the overall program of DMD digital photolithography system, analyse and design each part of the system. On the whole, DMD digital photolithography system consists of upper-computer system, control system and optical system. Upper-computer system is the centre of control and administration. The whole system is supervised by host computer and subsystem is controlled by MCU respectively. Each MCU exchanges information and data through computer interface. Control system is composed of several subsystems such as master-slave computer interface, step motor drive, limit switch, DMD drive, solenoid valve drive subsystem. Illumination system, digital micro-mirror device (DMD) and projection objective made up optical system. Emitted from light source, light beam goes through illumination system and then illuminate mask (DMD). At the same time, DMD drive is performed and mask image is shaped. Then, the image is copied to light-sensitive photoresist by projection objective, which is coated on the substrate. Secondly, investigating key technologies such as the software design of upper-computer and control system, we set up experimental platform to carry out the relevant tests and experiments analysis. Moreover, we complement integration of the system and summarize system characteristics and difference. Finally, exposure experiments using light-sensitive photoresist are carried out. The results showed that the line width of submicron, steep sidewall can be realized by the designed system.

Paper Details

Date Published: 22 October 2010
PDF: 10 pages
Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 76570P (22 October 2010); doi: 10.1117/12.865240
Show Author Affiliations
Yufang Rao, Nanchang HangKong Univ. (China)
Yiqing Gao, Nanchang HangKong Univ. (China)
Ningning Luo, Nanchang HangKong Univ. (China)
Nanjing Univ. of Aeronautics and Astronautics (China)


Published in SPIE Proceedings Vol. 7657:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Tianchun Ye; Sen Han; Masaomi Kameyama; Song Hu, Editor(s)

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