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Proceedings Paper

How to match without copying: an approach for APSM mask process matching using aerial imaging
Author(s): M. Sczyrba; C. Romeo; F. Schurack; T. Castro; B. Connolly
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Paper Abstract

For mask signature matching in the case of alternating phase-shifting mask it is shown that it is can be achieved using matching of aerial imaging. This is in contrast to the traditional approach of manufacturing an identical copy of the reference mask. Beside description of the method AIMS and wafer data are shown that proof its successful application on a product mask.

Paper Details

Date Published: 24 September 2010
PDF: 11 pages
Proc. SPIE 7823, Photomask Technology 2010, 78231Z (24 September 2010); doi: 10.1117/12.865236
Show Author Affiliations
M. Sczyrba, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
C. Romeo, Numonyx (Italy)
F. Schurack, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
T. Castro, Numonyx (United States)
B. Connolly, Toppan Photomasks, Inc. (Germany)


Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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