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Proceedings Paper

Nanomachining of non-orthogonal mask patterns
Author(s): Tod Robinson; Daniel Yi; Roy White; Ron Bozak; Mike Archuletta; David Lee
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Paper Abstract

Patterns which are not aligned to standard orthogonal (x and y ordinate) directions have recently been developed for advanced lithography nodes. Efforts have been successful in developing single pass nanomachining repair processes to meet the printability requirements for these patterns. This development makes use of the latest improvements made to the COBRA repair process (the Enhanced COBRA process typically completed in less than 2 minutes of repair time) with symmetric NanoBits to repair opposing critical edges of bridging defects. It also required fundamental changes in the software tools to allow automated detection of the angle of the edges and the application of pre-programmed repair edge biases normal (90°) to the detected angled edges. Additionally, some other new improvements (hardware, software, and process) are reviewed in light of more traditional nanomachining repairs.

Paper Details

Date Published: 27 May 2010
PDF: 9 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481H (27 May 2010); doi: 10.1117/12.865198
Show Author Affiliations
Tod Robinson, RAVE LLC (United States)
Daniel Yi, RAVE LLC (United States)
Roy White, RAVE LLC (United States)
Ron Bozak, RAVE LLC (United States)
Mike Archuletta, RAVE LLC (United States)
David Lee, RAVE LLC (United States)

Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)

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