Share Email Print
cover

Proceedings Paper

Uniform illumination for large area digital speckle pattern interferometry using multibeam
Author(s): Zhanhua Huang; Meng Zhu; Huaiyu Cai; Yinxin Zhang
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Using Digital Speckle Pattern Interferometry (DSPI) method measuring the large object in practice, the primarily problem is uniform illumination. This paper presents a method that using multiple laser beams to enlarge the illumination area and analysis the non-uniform illumination influences for interferogram. We design an illumination model using 10 semiconductor lasers for interferometer, and corresponding experiment shows that this method is suitable for industrial measurement in large area detection.

Paper Details

Date Published: 11 October 2010
PDF: 7 pages
Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 765614 (11 October 2010); doi: 10.1117/12.865157
Show Author Affiliations
Zhanhua Huang, Tianjin Univ. (China)
Meng Zhu, Tianjin Univ. (China)
Huaiyu Cai, Tianjin Univ. (China)
Yinxin Zhang, Tianjin Univ. (China)


Published in SPIE Proceedings Vol. 7656:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Jose M. Sasian; Libin Xiang; Sandy To, Editor(s)

© SPIE. Terms of Use
Back to Top