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Proceedings Paper

Novel laser beam collimation system with Hartmann-Shack wavefront sensor as a tool
Author(s): Jiajie Wu; Jiabi Chen; Ancheng Xu; Xiaoyan Gao
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Paper Abstract

Collimation of laser beam plays a very important role in many aspects of applied optics including human eye aberration measurement. In this article, a new type of method which could be used to collimate laser beam is proposed. This new method of adjustment is characterized by objective, measurable and repeatable. On the other hand, we have also established a complete ocular aberration measurement system which is based on the principle of Hartmann-Shack and used Hartmann-Shack wavefront sensor as its detector. In every stage of installation of this ocular aberration system, the degree of defocus and collimation is measured and adjusted in accordingly. Hence, the effective focal length of each length we use is precisely measured and the collimation of laser beam is reassured. Our experiments clearly show that this kind of new ocular aberration measurement system can effectively compensate the errors of lens and installation deviation during the process of establishing ocular aberration measuring system. Considering this technique could be used in other fields of area where highly calibrated parallel light beams are needed, this improvement could be very crucial for the use of future.

Paper Details

Date Published: 12 October 2010
PDF: 6 pages
Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 765648 (12 October 2010); doi: 10.1117/12.864693
Show Author Affiliations
Jiajie Wu, Univ. of Shanghai for Science and Technology (China)
Jiabi Chen, Univ. of Shanghai for Science and Technology (China)
Ancheng Xu, Univ. of Shanghai for Science and Technology (China)
Xiaoyan Gao, Univ. of Shanghai for Science and Technology (China)


Published in SPIE Proceedings Vol. 7656:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Jose M. Sasian; Libin Xiang; Sandy To, Editor(s)

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