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Proceedings Paper

Monitor the nanometer scale thickness change of optical thin film
Author(s): Yuxiao Yang; Zhengli Dai; Lei Wang
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Paper Abstract

In this paper, the nanometer scale change of optical thickness is detected in real time depend upon the spectrum phase shift of white-light interference resulted in two interface of thin film. The setup and the spectrum signal processing software are introduced. The filter is designed through analyzing the noise features of the reflect spectrum signal gathered from the system. It is proved that a wave-let filter is the most effective method in filter noise. Error of the signal processing is discussed in the end. Due to this study, the software, which is used to real-time monitor the nanometer scale thickness change of thin film, is developed. Experiments show that the system has high sensitivity, high precision, lower cost and working on a high reliability.

Paper Details

Date Published: 11 October 2010
PDF: 7 pages
Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 76563N (11 October 2010); doi: 10.1117/12.864438
Show Author Affiliations
Yuxiao Yang, Xi'an Jiaotong Univ. (China)
Zhengli Dai, Xi'an Jiaotong Univ. (China)
Lei Wang, Xi'an Jiaotong Univ. (China)


Published in SPIE Proceedings Vol. 7656:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Jose M. Sasian; Libin Xiang; Sandy To, Editor(s)

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