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Proceedings Paper

Mask inspection system with variable sensitivity and printability verification function
Author(s): Takafumi Inoue; Kenichi Takahara; Hideo Tsuchiya; Masakazu Tokita; Tadao Inoue; Masaki Yamabe
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Paper Abstract

We report on the development of a new mask inspection technology that makes total inspection faster and less costly. The new technology adopts a method of selecting a defect detection sensitivity level for every local area, defined by factors such as defect judgment algorithm and defect judgment threshold. This approach results in a reduction of pseudodefect count leading to shorter inspection and review time. Selected defect detection sensitivity levels for every local area are extracted from a database of Mask Data Rank (MDR) that is based on the design intent from the design stage, and/or on a pre-analysis of inspection pattern data. The proposed system also executes a printability verification function, not only for the mask defect regions but also for specific portions where high Mask Error Enhancement Factor (MEEF) is determined. It is necessary to ascertain suppression of pseudo-defect detection for extremely complicated masks such as masks with Source-Mask Optimization (SMO). This work reports on the new mask inspection system.

Paper Details

Date Published: 25 May 2010
PDF: 10 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481G (25 May 2010); doi: 10.1117/12.864415
Show Author Affiliations
Takafumi Inoue, Association of Super-Advanced Electronics Technologies (Japan)
Kenichi Takahara, Association of Super-Advanced Electronics Technologies (Japan)
Hideo Tsuchiya, Association of Super-Advanced Electronics Technologies (Japan)
Masakazu Tokita, Association of Super-Advanced Electronics Technologies (Japan)
Tadao Inoue, Association of Super-Advanced Electronics Technologies (Japan)
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)

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