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Proceedings Paper

Qualification of BitClean technology in photomask production
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Paper Abstract

Makers and users of advanced technology photomasks have seen increased difficulties with the removal of persistent, or stubborn, nano-particle contamination. Shrinking pattern geometries, and new mask clean technologies to minimize haze, have both increased the number of problems and loss of mask yield due to these non-removable nano-particles. A novel technique (BitCleanTM) has been developed using the MerlinTM platform, a scanning probe microscope system originally designed for nanomachining photomask defect repair. Progress in the technical development of this approach into a manufacture-able solution is reviewed and its effectiveness is shown in selectively removing adherent particles without touching surrounding sensitive structures. Results will also be reviewed that were generated in the qualification and acceptance of this new technology in a photomask production environment. These results will be discussed in their relation to the minimum particle size allowed on a given design, particle removal efficiency per pass of the NanoBitTM (PREPP), and the resultant average removal throughput of particles unaffected by any other available mask clean process.

Paper Details

Date Published: 25 September 2010
PDF: 9 pages
Proc. SPIE 7823, Photomask Technology 2010, 782326 (25 September 2010); doi: 10.1117/12.864381
Show Author Affiliations
Tod Robinson, RAVE LLC (United States)
Roy White, RAVE LLC (United States)
Ron Bozak, RAVE LLC (United States)
Mike Archuletta, RAVE LLC (United States)
David Brinkley, RAVE LLC (United States)
Daniel Yi, RAVE LLC (United States)


Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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