Share Email Print

Proceedings Paper

Mask cleaning process evaluation and modeling
Author(s): Pavel Nesladek; Steve Osborne
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Large error bars in cleaning experiments are commonly accepted in mask making but such errors restrict potential improvements in cleaning and restrict the uniform delivery of megasonic (MS) energy. Hence, large error limits in particle removals have an impact to operational costs based on contamination and breakage. New data handling methods are developed here, which exceed the current capability scatterometric particle measurement methods and which create a better statistical basis for interpretation. These improved data treatment methods employ subdivisions of the mask into regions as small as mm2. The effective number of runs becomes many thousands of time greater which can compensate for the small number of blanks available for tests due to restricted costs. This new technology is combined with a precise modeling of the MS tracking patterns on a plate and allows better comparisons between theoretical modeling and experimentally observed cleans. The combination of these two methods yields an improved determination of rate kinetics for particle removal. Collectively, these methods provide the basis for better interpretation of the spatial non-uniformities seen in MS spin cleaning methods with obvious consequences to manufacturing costs.

Paper Details

Date Published: 15 May 2010
PDF: 10 pages
Proc. SPIE 7545, 26th European Mask and Lithography Conference, 75450J (15 May 2010); doi: 10.1117/12.864335
Show Author Affiliations
Pavel Nesladek, Advanced Mask Technology Ctr. (Germany)
Steve Osborne, Sigmameltec Ltd. (Japan)

Published in SPIE Proceedings Vol. 7545:
26th European Mask and Lithography Conference
Uwe F.W. Behringer; Wilhelm Maurer, Editor(s)

© SPIE. Terms of Use
Back to Top