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Proceedings Paper

Checkerboard pattern for PSF parameter determination in electron beam lithography
Author(s): Manuela Gutsch; Kang-Hoon Choi; Martin Freitag; Marc Hauptmann; Christoph Hohle; Philipp Jaschinsky; Katja Keil
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Paper Abstract

In electron beam lithography, the electron scattering and the corresponding proximity effect highly influence the feature resolution. Especially for sub-100 nm features a compensation for this effect is needed. There are several methods of determination of the proximity parameters, which mostly are time-consuming and complex due to a need of an initial proximity effect correction and immense measurement effort. In this paper the checkerboard pattern is proposed to provide the opportunity for proximity parameter determination in a fast and easy manner without using a sophisticated CD-SEM metrology. The concept is illustrated by simulation and first experimental results are shown.

Paper Details

Date Published: 15 May 2010
PDF: 9 pages
Proc. SPIE 7545, 26th European Mask and Lithography Conference, 754507 (15 May 2010); doi: 10.1117/12.864315
Show Author Affiliations
Manuela Gutsch, Fraunhofer Ctr. Nanoelectronic Technologies (Germany)
Kang-Hoon Choi, Fraunhofer Ctr. Nanoelectronic Technologies (Germany)
Martin Freitag, Fraunhofer Ctr. Nanoelectronic Technologies (Germany)
Marc Hauptmann, Fraunhofer Ctr. Nanoelectronic Technologies (Germany)
Christoph Hohle, Fraunhofer Ctr. Nanoelectronic Technologies (Germany)
Philipp Jaschinsky, Fraunhofer Ctr. Nanoelectronic Technologies (Germany)
Katja Keil, Fraunhofer Ctr. Nanoelectronic Technologies (Germany)


Published in SPIE Proceedings Vol. 7545:
26th European Mask and Lithography Conference
Uwe F.W. Behringer; Wilhelm Maurer, Editor(s)

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