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Proceedings Paper

Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography
Author(s): C. L. Lu; C. H. Yu; W. H. Liu; Luke Hsu; Angus Chin; S. C. Lee; Anthony Yen; Gaston Lee; Peter Dress; Sherjang Singh; Uwe Dietze
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Paper Abstract

The fundamentals of droplet-based cleaning of photomasks are investigated and performance regimes that enable the use of binary spray technologies in advanced mask cleaning are identified. Using phase Doppler anemometry techniques, the effect of key performance parameters such as liquid and gas flow rates and temperature, nozzle design, and surface distance on droplet size, velocity, and distributions were studied. The data are correlated to particle removal efficiency (PRE) and feature damage results obtained on advanced photomasks for 193-nm immersion lithography.

Paper Details

Date Published: 25 September 2010
PDF: 9 pages
Proc. SPIE 7823, Photomask Technology 2010, 782325 (25 September 2010); doi: 10.1117/12.864303
Show Author Affiliations
C. L. Lu, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
C. H. Yu, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
W. H. Liu, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Luke Hsu, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Angus Chin, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
S. C. Lee, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Anthony Yen, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Gaston Lee, HamaTech APE GmbH & Co. KG (Taiwan)
Peter Dress, HamaTech APE GmbH & Co. KG (Germany)
Sherjang Singh, HamaTech APE USA, Inc. (United States)
Uwe Dietze, HamaTech APE USA, Inc. (United States)


Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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