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Complementing and adding to SEM performance with the addition of XRF, Raman, CL and PL spectroscopy and imaging
Author(s): E. Leroy; S. Mamedov; E. Teboul; A. Whitley; D. Meyer; L. Casson
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Paper Abstract

Electron microscopy, along with many other surface science and analytical techniques, offers an array of complementary sub-techniques that provide additional information to enhance the primary analysis or imaging mode. Most electron microscopes are built with several additional ports for the installation of complementary analysis modules. One type of analysis which is particular useful in geology and semiconductor analysis is cathodoluminescence (CL). A new technique has been developed to allow complementary optical measurements using the electron beam from the SEM, compatible with most standard commercial SEM systems. Among the optical measurements accessible using the Cathodoluminescence Universal Extension (CLUE) module are CL, Raman, PL and EDX spectroscopy and imaging. This paper shows the advantages of using these complementary techniques, and how they can be applied to analysis of geological and semiconductor materials.

Paper Details

Date Published: 10 June 2010
PDF: 6 pages
Proc. SPIE 7729, Scanning Microscopy 2010, 77290R (10 June 2010); doi: 10.1117/12.864236
Show Author Affiliations
E. Leroy, HORIBA Jobin Yvon Inc. (United States)
S. Mamedov, HORIBA Jobin Yvon Inc. (United States)
E. Teboul, HORIBA Jobin Yvon Inc. (United States)
A. Whitley, HORIBA Jobin Yvon Inc. (United States)
D. Meyer, HORIBA Jobin Yvon Inc. (United States)
L. Casson, HORIBA Jobin Yvon Inc. (United States)

Published in SPIE Proceedings Vol. 7729:
Scanning Microscopy 2010
Michael T. Postek; Dale E. Newbury; S. Frank Platek; David C. Joy, Editor(s)

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