Share Email Print

Proceedings Paper

Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction
Author(s): Masaki Yamabe; Tadao Inoue; Masahiro Shoji; Akio Yamada; Hiromichi Hoshi; Kenichi Takahara
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

As the feature sizes of LSI become smaller, the increase in mask manufacturing time (TAT) and cost is becoming critical and posing challenges to the mask industry and device manufacturers. In May 2006, ASET Mask D2I launched a 4-year program for the reduction in mask manufacturing TAT and cost, and the program was completed in March 2010. The focus of the program was on the design and implementation of a synergetic strategy involving concurrent optimization of MDP, mask writing, and mask inspection. The strategy was based upon four key elements: a) common data format, b) pattern prioritization based on design intent, c) an improved approach in the use of repeating patterns, and d) parallel processing. In the program, various software and hardware tools were developed to realize the concurrent optimization. After evaluating the effectiveness of each item, we estimated the reduction in mask manufacturing TAT and cost by the application of results obtained from the Mask D2I programs. We found that mask manufacturing TAT and cost can be reduced to 50% (or less) and to about 60% respectively.

Paper Details

Date Published: 24 September 2010
PDF: 15 pages
Proc. SPIE 7823, Photomask Technology 2010, 78230S (24 September 2010); doi: 10.1117/12.864196
Show Author Affiliations
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)
Tadao Inoue, SII NanoTechnology Inc. (Japan)
Masahiro Shoji, Nippon Control Systems Corp. (Japan)
Akio Yamada, Advantest Corp. (Japan)
Hiromichi Hoshi, JEOL Ltd. (Japan)
Kenichi Takahara, NuFlare Technology, Inc. (Japan)

Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

© SPIE. Terms of Use
Back to Top