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Proceedings Paper

Duplicated templates for discrete track media
Author(s): Atsushi Tatsugawa; Noriko Yamashita; Tadashi Oomatsu; Kenji Saitou; Takashi Katou; Toshihide Ishioka; Kazuyuki Usuki
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Paper Abstract

Duplicated templates from a patterned silicon master were studied. The pattern was fabricated on a silicon wafer by rotary electron beam (EB) writer and reactive ion etching (RIE). 2.5-inch full surface discrete track media (DTM) templates of TP70nm supporting skewed servo patterns and discrete tracks were fabricated. The pattern on the silicon master was successfully transferred to quartz templates by UV nanoimprint lithography (NIL) and RIE using a specially prepared UV-NIL resist. TP60nm pattern fabrication was also accomplished by this same hard mask-less method. Servo pattern printing (SPP) was used to investigate the repeatable run-out (RRO) of servo patterns. Nickel molds and quartz templates were duplicated from the same silicon master by their respective processes and their RROs compared. It was found that the duplication process (quartz or nickel) influenced the RRO profile and that the quartz NIL process did not significantly degrade RRO.

Paper Details

Date Published: 24 September 2010
PDF: 7 pages
Proc. SPIE 7823, Photomask Technology 2010, 78233L (24 September 2010); doi: 10.1117/12.864192
Show Author Affiliations
Atsushi Tatsugawa, FUJIFILM Corp. (Japan)
Noriko Yamashita, FUJIFILM Corp. (Japan)
Tadashi Oomatsu, FUJIFILM Corp. (Japan)
Kenji Saitou, FUJIFILM Corp. (Japan)
Takashi Katou, FUJIFILM Corp. (Japan)
Toshihide Ishioka, FUJIFILM Corp. (Japan)
Kazuyuki Usuki, FUJIFILM Corp. (Japan)

Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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