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Proceedings Paper

A new CDSEM metrology method for thin film hardmasks patterns using multiple detectors
Author(s): Sumito Harada; Yuta Chihara; Motoji Hirano; Toshi Iwai; Masayuki Kuribara; Ikuo Iko; Masahiro Seyama; Jun Matsumoto; Takayuki Nakamura
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Paper Abstract

Thin film hardmasks with 10nm or less are used in double patterning techniques to generate fine patterns for 32nm-node and beyond. Using a conventional Mask CDSEM for ultra accurate measurement of patterns on these thin film hardmasks is difficult due to weakness of the edge profiles generated by a scanning electron beam. Additionally, the tones of a SEM image can be reversed due to a charging phenomenon, which causes false recognition of lines and spaces. This paper addresses ultra accurate measurement of thin film hardmasks using a new measurement algorithm that is applied to profiles obtained from multiple detectors.

Paper Details

Date Published: 24 September 2010
PDF: 7 pages
Proc. SPIE 7823, Photomask Technology 2010, 78233H (24 September 2010); doi: 10.1117/12.864171
Show Author Affiliations
Sumito Harada, Advantest Corp. (Japan)
Yuta Chihara, Advantest Corp. (Japan)
Motoji Hirano, Advantest Corp. (Japan)
Toshi Iwai, Advantest Corp. (Japan)
Masayuki Kuribara, Advantest Corp. (Japan)
Ikuo Iko, Advantest Corp. (Japan)
Masahiro Seyama, Advantest Corp. (Japan)
Jun Matsumoto, Advantest Corp. (Japan)
Takayuki Nakamura, Advantest Corp. (Japan)

Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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