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Proceedings Paper

Using principal component analysis for photomask CD signature investigations
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Paper Abstract

Reticle critical dimension (CD) errors must be minimized in order for photomask manufacturers to meet tight CD uniformity (CDU) requirements. Determining the source of reticle CD errors and reducing or eliminating their CDU contributions are some of the most relevant tasks facing process engineers. The AMTC has applied principal component analysis (PCA) to reticle resist CD measurements in order to examine variations in the data. PCA provided the major components of resist CD variation which were rescaled into reticle CD signatures. The dominant component of CD signature variation is very similar in shape and magnitude between two different chemically amplified resist (CAR) processes, most likely indicating the variation source is a common process or tool. CD variational signatures from PCA were used as a basis for launching investigations into potential reticle CD error sources. PCA was further applied to resist CD measurements from alternate process tools to assist efforts in judging the effectiveness of resist CD signature matching.

Paper Details

Date Published: 24 September 2010
PDF: 11 pages
Proc. SPIE 7823, Photomask Technology 2010, 78232O (24 September 2010); doi: 10.1117/12.864139
Show Author Affiliations
G. R. Cantrell, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Christian Bürgel, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Axel Feicke, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Martin Sczyrba, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Clemens Utzny, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)


Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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