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Proceedings Paper

CMP dummy pattern based on VSB writer load
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Paper Abstract

The load of VSB-EB mask writers has significantly increased since particularly RET/OPC and CMP dummy pattern generation technologies were widely adopted into designs at advanced nodes, with the result that the volume of mask data patterns was increased exponentially. In order to reduce the load of VSB mask writer, we've focused on CMP dummy patterns and developed a method of reducing CMP dummy pattern, which can smartly write CMP dummy patterns without not only deteriorating the CMP effects by them and also increasing the total number of the mask writer's shot count. To that end, we are aiming to establish a VSB-mask-writer-friendly CMP dummy pattern generation flow with CMP simulator developers by providing a mask writer parameter for them. This paper shows the first experimental results of our mask writer's load reduction work.

Paper Details

Date Published: 26 May 2010
PDF: 9 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481M (26 May 2010); doi: 10.1117/12.864104
Show Author Affiliations
Wakahiko Sakata, Dai Nippon Printing Co., Ltd. (Japan)
Isaku Osawa, Dai Nippon Printing Co., Ltd. (Japan)
Shogo Narukawa, Dai Nippon Printing Co., Ltd. (Japan)
Tadahiko Takikawa, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Mohri, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)

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