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Proceedings Paper

Influence on digital photolithography intensity by collimated Gaussian beam
Author(s): Shuai He; Yiqing Gao; Ningning Luo; Yufang Rao
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Paper Abstract

The theory of Gaussian beam expansion and collimation has been investigated. Based on Collins diffraction integral and matrix decomposition method, the propagation characteristics of Gaussian beam passing through beam expansion and collimation system is analyzed. The corresponding mathematical model is established. Simulations results indicate that the optical field distribution behind beam expansion and collimation system is still with Gaussian attribute. Then we demonstrate the optical field of beam with Gaussian attribute passing through 2-D sinusoidal grating. Finally, the step depth error of binary element is evaluated under illumination of Gaussian beam. The theoretical analysis and simulation results have reference for the establishment of digital lithography model and the optimization of beam expansion and collimation system.

Paper Details

Date Published: 22 October 2010
PDF: 8 pages
Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 76570L (22 October 2010); doi: 10.1117/12.864087
Show Author Affiliations
Shuai He, Nanchang HangKong Univ. (China)
Yiqing Gao, Nanchang HangKong Univ. (China)
Ningning Luo, Nanchang HangKong Univ. (China)
Nanjing Univ. of Aeronautics and Astronautics (China)
Yufang Rao, Nanchang HangKong Univ. (China)


Published in SPIE Proceedings Vol. 7657:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Tianchun Ye; Sen Han; Masaomi Kameyama; Song Hu, Editor(s)

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