Share Email Print
cover

Proceedings Paper

Evaluation of mask manufacturing efficiency using mask data rank information
Author(s): Kokoro Kato; Masakazu Endo; Tadao Inoue; Masaki Yamabe; Shigetoshi Nakatake
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The photomask cost is becoming one of the challenging issues in the semiconductor industry, as the cost of photomasks has been rising year by year. ASET started Mask D2I (Mask Design, Drawing and Inspection Technology) project with the sponsorship from the NEDO (New Energy and Industrial Technology Development Organization) in 2006 for the purpose of the mask cost reduction. In earlier papers[1-5], we introduced the idea of photomask data prioritization method which is referred to as Mask Data Rank (MDR). We have built our software system to convert Design Intent (DI) to MDR with cooperation of STARC. Then we showed the results of experiments with mask data provided by semiconductor companies. In this paper we show the additional report of mask inspection experiments using real photomasks. Then we show the evaluation results about mask drawing time reduction using MDR flow. Finally we introduce detailed algorithm to extract design intent from analog circuits.

Paper Details

Date Published: 26 May 2010
PDF: 9 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481N (26 May 2010); doi: 10.1117/12.864084
Show Author Affiliations
Kokoro Kato, Association of Super-Advanced Electronics Technologies (Japan)
Masakazu Endo, Association of Super-Advanced Electronics Technologies (Japan)
Tadao Inoue, Association of Super-Advanced Electronics Technologies (Japan)
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)
Shigetoshi Nakatake, Kitakyushu Univ. (Japan)


Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)

© SPIE. Terms of Use
Back to Top