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Proceedings Paper

Study of the molecular contaminants deposition on Cr, MoSi and SiO2 surfaces representative of photomasks layers
Author(s): Hervé Fontaine; Sylviane Cetre; Gaël Demenet; Fabien Piallat
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Paper Abstract

We investigated the deposition of the molecular contaminants on Cr, MoSi and quartz photomask surfaces by means of representative Cr, MoSi and SiO2 layers deposited on wafers using TD-GCMS for the organics and LPE-IC for the SO2 analysis. Mask-like layers were exposed to organic contaminants outgassed by three different types of mask pods during storage steps and Cr films were put in SO2 controlled contaminated atmosphere. Organic species contaminating the different mask surfaces were identified depending on time. A rapid contamination kinetic was highlighted. Results have shown that low volatile organic compounds have higher deposition rates and that few specific molecules (such as caprolactam ; acrylic acid, dodecyl ester, butyldiglycol...) contribute in very significant levels (few E+13 atC/cm2). It also appeared that organics present a higher affinity for quartz and MoSi layers than for Cr surfaces but also that some compounds can have a specific affinity depending on the surface. These affinity differences have been quantified through the calculation of the contaminants sticking coefficients. Regarding the SO2 deposition, Cr surfaces have showed a strong ability to be polluted in clean room conditions, up to a saturation level just higher than 1E+14 SO2/cm2. The kinetic is rapid and in good agreement with a Langmuir-type adsorption model allowing the determination of the deposition kinetic constant. Furthermore, it was showed a significant enhancement of SO2 deposition with air humidity. Finally, this work contributes to a better knowledge of the molecular contaminants deposition behavior on mask surfaces providing relevant data to control the photomask contamination in order to prevent crystal growth issues.

Paper Details

Date Published: 15 May 2010
PDF: 12 pages
Proc. SPIE 7545, 26th European Mask and Lithography Conference, 75450I (15 May 2010); doi: 10.1117/12.863877
Show Author Affiliations
Hervé Fontaine, CEA, LETI, MINATEC (France)
Sylviane Cetre, CEA, LETI, MINATEC (France)
Gaël Demenet, CEA, LETI, MINATEC (France)
Fabien Piallat, CEA, LETI, MINATEC (France)


Published in SPIE Proceedings Vol. 7545:
26th European Mask and Lithography Conference
Uwe F.W. Behringer; Wilhelm Maurer, Editor(s)

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