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Proceedings Paper

Pupil masks for 2-D intensity synthesis in a high numerical aperture focusing system
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Paper Abstract

A high numerical aperture (NA) lens is used in many applications that require tightly focused beams including microscopy. The Debye-Wolf electromagnetic diffraction integral describes focusing by high NA lenses. Using an eigenfunction expansion of this integral, we numerically obtain a pupil mask that generates an arbitrary, within the diffraction limit, intensity distribution at the Gaussian focal plane.

Paper Details

Date Published: 20 May 2010
PDF: 7 pages
Proc. SPIE 7743, Southeast Asian International Advances in Micro/Nanotechnology, 77430N (20 May 2010); doi: 10.1117/12.863847
Show Author Affiliations
Leelada Rattanavija, Chulalongkorn Univ. (Thailand)
Sherif S. Sherif, Univ. of Manitoba (Canada)
Waleed S. Mohammed, Chulalongkorn Univ. (Thailand)


Published in SPIE Proceedings Vol. 7743:
Southeast Asian International Advances in Micro/Nanotechnology
Waleed S. Mohammed; Te-Yuan Chung, Editor(s)

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