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Proceedings Paper

Defect inspection with an EUV microscope
Author(s): Stefan Herbert; Aleksey Maryasov; Larissa Juschkin; Rainer Lebert; Klaus Bergmann
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Paper Abstract

An actinic EUV microscope for defect detection on mask blanks for operation in dark field using table top discharge produced plasma (DPP) source has been developed. Several test structures (pits and bumps) and natural defects on multilayer mirrors were characterized with an atomic force microscope (AFM) and then investigated by our Schwarzschild Objective (SO) based EUV microscope. Possible defect detection limits with large field of view (FOV) and moderate magnification will be discussed in terms of required source photon flux and detection camera performance.

Paper Details

Date Published: 15 May 2010
PDF: 9 pages
Proc. SPIE 7545, 26th European Mask and Lithography Conference, 75450O (15 May 2010); doi: 10.1117/12.863818
Show Author Affiliations
Stefan Herbert, RWTH Aachen Univ. (Germany)
Aleksey Maryasov, RWTH Aachen Univ. (Germany)
Larissa Juschkin, RWTH Aachen Univ. (Germany)
Rainer Lebert, Bruker Advanced Supercon GmbH (Germany)
Klaus Bergmann, Fraunhofer Institute for Laser Technology (Germany)


Published in SPIE Proceedings Vol. 7545:
26th European Mask and Lithography Conference
Uwe F.W. Behringer; Wilhelm Maurer, Editor(s)

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