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Proceedings Paper

Increased productivity of repair verification by offline analysis of aerial images
Author(s): Ernesto Villa; Luca Sartelli; Hiroyuki Miyashita; Thomas Scheruebl; Rigo Richter; Thomas Thaler
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Paper Abstract

Using AIMSTM to qualify repairs of defects on photomasks is the industry standard. AIMSTM provides a reasonable matching of lithographic imaging performances without the need of wafer prints. The need of utilisation of this capability by photomask manufacturers has risen due to the increased complexity of layouts incorporating aggressive RET and phase shift technologies as well as tighter specifications have pushed aerial image metrology to consider CD performance results in addition to the traditional intensity verification. The content of the paper describes the utilisation of the AIMSTM Repair Verification (RV) software for the verification of aerial images in a mask shop production environment. The software is used to analyze images from various AIMSTM tool generations and the two main routines, Multi Slice Analysis (MSA) and Image Compare (IC), are used to compare defective and non-defective areas of aerial images. It is detailed how the RV software cleans "non real" errors potentially induced by operator misjudgements, thus providing accurate and repeatable analyses all proven against the results achieved manually. A user friendly GUI drives the user through few simple, fast and safe operations and automatically provides summary tables containing all the relevant results of the analysis that can be easily exported in a proper format and sent out to the customer as a technical documentation. This results in a sensible improvement of the throughput of the printability evaluation process in a mask manufacturing environment, providing reliable analyses at a higher productivity.

Paper Details

Date Published: 27 May 2010
PDF: 10 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481F (27 May 2010); doi: 10.1117/12.863806
Show Author Affiliations
Ernesto Villa, DNP Photomask Europe (Italy)
Luca Sartelli, DNP Photomask Europe (Italy)
Hiroyuki Miyashita, DNP Photomask Europe (Italy)
Thomas Scheruebl, Carl Zeiss SMS GmbH (Germany)
Rigo Richter, Carl Zeiss SMS GmbH (Germany)
Thomas Thaler, Carl Zeiss SMS GmbH (Germany)


Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)

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