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Proceedings Paper

Optimize the OPC control recipe with cost function
Author(s): Qingwei Liu; Liguo Zhang
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Paper Abstract

With the design rule shrinks rapidly, full chip robust Optical Proximity Correction (OPC) will definitely need longer time due to the increasing pattern density. Furthermore, to achieve a perfect OPC control recipe becomes more difficult. For, the critical dimension of the design features is deeply sub exposure wavelength, and there is only limited room for the OPC correction. Usually very complicated scripts need to be developed to handle the shrinking designs, which can be infinitely complicated. So when you are defining a parameter value in your OPC control recipe, one problem is how to find the optimum setting. And usually there are a bund of parameters in the script, some of which may have impact on others performance. We here demonstrate an approach of how to find the optimized setting of the critical parameters with cost function. And this will be helpful to reduce the difficulty for OPC recipe development.

Paper Details

Date Published: 24 September 2010
PDF: 6 pages
Proc. SPIE 7823, Photomask Technology 2010, 78233M (24 September 2010); doi: 10.1117/12.863602
Show Author Affiliations
Qingwei Liu, Semiconductor Manufacturing International Corp. (China)
Liguo Zhang, Mentor Graphics Corp. (China)

Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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