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Proceedings Paper

Deep-UV KrF lithography for the fabrication of Bragg gratings on SOI rib waveguides
Author(s): J. Bauer; D. Stolarek; L. Zimmermann; I. Giuntoni; U. Haak; H. Richter; S. Marschmeyer; A. Gajda; J. Bruns; K. Petermann; B. Tillack
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Paper Abstract

In this Paper we present a deep ultra-violet lithography (248nm) based double patterning technique for the fabrication of Bragg gratings on SOI rib waveguides. The principle of the used double patterning technique is presented, as well the influence of the process variation on the device performances. The influence of the overlay error was identified as a possibly limiting factor for the application of this technique. Usable structures were realized, in spite of small overlay error and non-rectangular grating profile. The optical characterization showed that the presented technique is capable to provide high performance Si waveguides and Bragg gratings.

Paper Details

Date Published: 15 May 2010
PDF: 6 pages
Proc. SPIE 7545, 26th European Mask and Lithography Conference, 75450L (15 May 2010); doi: 10.1117/12.863538
Show Author Affiliations
J. Bauer, IHP GmbH (Germany)
D. Stolarek, IHP GmbH (Germany)
L. Zimmermann, IHP GmbH (Germany)
I. Giuntoni, Technische Univ. Berlin (Germany)
U. Haak, IHP GmbH (Germany)
H. Richter, IHP GmbH (Germany)
S. Marschmeyer, IHP GmbH (Germany)
A. Gajda, IHP GmbH (Germany)
J. Bruns, Technische Univ. Berlin (Germany)
K. Petermann, Technische Univ. Berlin (Germany)
B. Tillack, IHP GmbH (Germany)
Technische Univ. Berlin (Germany)


Published in SPIE Proceedings Vol. 7545:
26th European Mask and Lithography Conference
Uwe F.W. Behringer; Wilhelm Maurer, Editor(s)

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