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Proceedings Paper

Potential applications of photothermal interferometric detection technique in the single-layer optical thin film system
Author(s): Honggang Hao; Jianwen Fang; Xiangming Liu
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Paper Abstract

The sensitive photothermal interferometric detection technique, in which an interference fringe pattern formed by overlapping two reflected probe beams from the front and rear surfaces of the sample with two interfaces was used to measure the photothermal signal, and its application for characterization of transparent (or partially transparent) plate samples had been theoretically and experimentally investigated in detail. Theoretical and experimental results demonstrated the proposed photothermal interferometric detection technique to be a sensitive photothermal method for the study of the thermophysical properties of transparent samples. Can this method be applied to the field of single-layer optical thin film system? We all know that a single-layer optical thin film is usually deposited on a substrate and has three interfaces. In this paper, based on the transmission theory of Gauss-beam, the interference effect of the reflection beams from a single layer film-substrate is studied. A theory is developed to describe the intensity profile of the interference fringe and the corresponded modulated photothermal interferometric signal. An experiment is performed with a ZnS-BK7 glass single-layer sample to measure the intensity distribution of the interference fringe pattern and the photothermal signal with CW laser excitation. Agreement is obtained between the theoretical predictions and experimental results. It shows the photothermal interferometric detection technique can be used to study the thermophysical properties of the single-layer optical thin film system.

Paper Details

Date Published: 11 October 2010
PDF: 8 pages
Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 76561Z (11 October 2010); doi: 10.1117/12.863187
Show Author Affiliations
Honggang Hao, Chongqing Univ. of Posts and Telecommunications (China)
Jianwen Fang, Zhejiang Normal Univ. (China)
Xiangming Liu, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 7656:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment

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