Share Email Print
cover

Proceedings Paper

Efficient simulation of three-dimensional EUV masks for rigorous source mask optimization and mask induced imaging artifact analysis
Author(s): P. Evanschitzky; T. Fühner; F. Shao; A. Erdmann
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In this paper a rigorous three dimensional EUV mask simulation model is presented. The mask near field is simulated with the Waveguide method which is similar to the RCWA approach. Additionally the method is extended by a so called decompositions technique. The mask image is computed by coupling the Waveguide method with a fully vectorial imaging simulation model based on an extended Abbe approach. The basic theory of the models is explained. The optimization and combination of both simulation approaches enables the simulation and analysis of larger EUV mask areas required for the analysis of complex three dimensional EUV mask structures as well as the very fast simulation of standard sized EUV mask areas required in the context of source mask optimizations. Corresponding simulation examples like a rigorous source mask optimization and a mask induced imaging artifact analysis of a larger mask area demonstrate the capabilities and the performance of the new simulation system.

Paper Details

Date Published: 15 May 2010
PDF: 10 pages
Proc. SPIE 7545, 26th European Mask and Lithography Conference, 75450D (15 May 2010); doi: 10.1117/12.863102
Show Author Affiliations
P. Evanschitzky, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
T. Fühner, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
F. Shao, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
A. Erdmann, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)


Published in SPIE Proceedings Vol. 7545:
26th European Mask and Lithography Conference
Uwe F.W. Behringer; Wilhelm Maurer, Editor(s)

© SPIE. Terms of Use
Back to Top