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Proceedings Paper

Spectroscopic ellipsometry of a-Si/SiO2 large waveband coating for the JWST-FGS-TFI etalon plates fabrication
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Paper Abstract

Previous publications for the JWST-FGS-TFI instrument described the design and fabrication of mirror coatings for scanning Fabry-Perot etalons. Since that time, we have extended the fabrication process using ellipsometry analysis over the full operational bandwidth from 1.0 to 5.0 microns for both mirror and anti-reflection coatings. This paper will present single and multiple layer ellipsometry analysis of the a-Si/SiO2 optical properties. Analysis improvement came from a-Si/SiO2 interface consideration and simultaneous use of ellipsometric data from Woollam V-VASE and IRVASE instruments. Simulations of reflectance and transmittance based on the ellipsometric analysis results will also be compared to spectrophotometric measurements for witness pieces.

Paper Details

Date Published: 20 August 2010
PDF: 14 pages
Proc. SPIE 7786, Current Developments in Lens Design and Optical Engineering XI; and Advances in Thin Film Coatings VI, 77860M (20 August 2010); doi: 10.1117/12.863034
Show Author Affiliations
Michel Poirier, INO Quebec (Canada)
Clinton Evans, COM DEV Ltd. (Canada)
Craig Haley, COM DEV Ltd. (Canada)
Driss Touahri, COM DEV Ltd. (Canada)
Rene Doyon, Univ. de Montréal (Canada)


Published in SPIE Proceedings Vol. 7786:
Current Developments in Lens Design and Optical Engineering XI; and Advances in Thin Film Coatings VI
R. Barry Johnson; Virendra N. Mahajan; Simon Thibault, Editor(s)

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