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Proceedings Paper

An analytic expression for the field dependence of FRINGE Zernike polynomial coefficients in rotationally symmetric optical systems
Author(s): Jannick P. Rolland; Christina Dunn; Kevin P. Thompson
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Paper Abstract

Zernike polynomials have emerged as the preferred method of characterizing as-fabricated optical surfaces. From here, over time, they have come to be used as a sparsely sampled representation of the state of alignment of assembled optical systems both during and at the conclusion of the alignment process. We show here that it is possible to develop the field dependence that analytically interconnects the coefficients of the Zernike polynomial (which has to-date been characterized only by its aperture dependence) as a more complete representation of an aligned rotationally symmetric optical system and in a paper to follow a misaligned optical system. This significant expansion to this valuable polynomial provides an important new tool for characterizing high performance optical systems throughout the optical design, fabrication, assembly, and interim and acceptance test process.

Paper Details

Date Published: 3 August 2010
PDF: 11 pages
Proc. SPIE 7790, Interferometry XV: Techniques and Analysis, 77900M (3 August 2010); doi: 10.1117/12.863025
Show Author Affiliations
Jannick P. Rolland, Univ. of Rochester (United States)
Christina Dunn, Univ. of Rochester (United States)
Kevin P. Thompson, Optical Research Associates (United States)

Published in SPIE Proceedings Vol. 7790:
Interferometry XV: Techniques and Analysis
Catherine E. Towers; Joanna Schmit; Katherine Creath, Editor(s)

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