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Proceedings Paper

Conductive carbon nanotubes for semiconductor metrology
Author(s): Victor Vartanian; Paul McClure; Vladimir Mancevski; Joseph J. Kopanski; Philp D. Rack; Ilona Sitnitsky; Matthew D. Bresin; Vince LaBella; Kathleen Dunn
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Paper Abstract

This paper presents an evaluation of e-beam assisted deposition and welding of conductive carbon nanotube (c-CNT) tips for electrical scanning probe microscope measurements. Variations in CNT tip conductivity and contact resistance during fabrication were determined as a function of tip geometry using tunneling AFM (TUNA). Conductive CNT tips were used to measure 2D dopant concentration as a function of annealing conditions in BF2-implanted samples.

Paper Details

Date Published: 15 September 2010
PDF: 15 pages
Proc. SPIE 7767, Instrumentation, Metrology, and Standards for Nanomanufacturing IV, 77670F (15 September 2010); doi: 10.1117/12.861315
Show Author Affiliations
Victor Vartanian, International SEMATECH Manufacturing Initiative (United States)
Paul McClure, Xidex Corp. (United States)
Vladimir Mancevski, Xidex Corp. (United States)
Joseph J. Kopanski, National Institute of Standards and Technology (United States)
Philp D. Rack, The Univ. of Tennessee (United States)
Ilona Sitnitsky, Univ. at Albany (United States)
Matthew D. Bresin, Univ. at Albany (United States)
Vince LaBella, Univ. at Albany (United States)
Kathleen Dunn, Univ. at Albany (United States)

Published in SPIE Proceedings Vol. 7767:
Instrumentation, Metrology, and Standards for Nanomanufacturing IV
Michael T. Postek, Editor(s)

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