Share Email Print
cover

Proceedings Paper

DLC/Si multilayer mirrors for EUV radiation
Author(s): Peter Gawlitza; Stefan Braun; Andreas Leson; Wouter Soer; Martin Jak; Vadim Banine
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In this paper, a new type of spectral filter mirrors for extreme ultraviolet radiation based on DLC/Si multilayer coatings is presented (DLC - diamond-like carbon). The coating is nearly transparent for infrared radiation (IR) of λ = 10.6 nm but highly reflective at λ = 13.5 nm (EUV). We deposited DLC/Si multilayers by ion beam sputter deposition with 40 and 60 periods exhibiting maximum EUV reflectances of about Rmax = 43 % and Rmax = 50 %, respectively. Combining IR antireflective and EUV reflective coatings, first prototype mirrors have been fabricated with an EUV reflectance of about 42.5 % and an IR reflectance of about 4.4 % at the same time. Investigations on the thermal behavior of the multilayer stack and the cleaning properties for tin contaminated mirror surfaces have been carried out. Excellent stabilities of EUV peak position and reflectance values have been found using annealing temperatures of up to 700 °C. Furthermore, several cycles of Sn etching under H2 reactive conditions have been applied to the mirrors without significant changes of the filter performance.

Paper Details

Date Published: 29 September 2010
PDF: 12 pages
Proc. SPIE 7802, Advances in X-Ray/EUV Optics and Components V, 78020A (29 September 2010); doi: 10.1117/12.861165
Show Author Affiliations
Peter Gawlitza, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)
Stefan Braun, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)
Andreas Leson, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)
Wouter Soer, Philips Research Nederland B.V. (Netherlands)
Martin Jak, Philips Research Nederland B.V. (Netherlands)
Vadim Banine, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 7802:
Advances in X-Ray/EUV Optics and Components V
Shunji Goto; Ali M. Khounsary; Christian Morawe, Editor(s)

© SPIE. Terms of Use
Back to Top