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Proceedings Paper

Study of 18.2-nm Schwarzschild microscope for plasma diagnostics
Author(s): Xin Wang; Baozhong Mu; Yi Huang; Zirong Zhai; Shengzhen Yi; Li Jiang; Jingtao Zhu; Zhanshan Wang; Hongjie Liu; Leifeng Cao; Yuqiu Gu
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Paper Abstract

A Schwarzschild microscope at 18.2 nm for ultra-fast laser plasma diagnostics has been developed. Based on the third-order aberration the microscope is designed for numerical aperture of 0.1 and magnification of 10. Spatial resolution of the objective can achieve 1250 lp/mm within the field of ±1 mm. Mo/Si multilayer films with peak throughout at 18.2 nm is designed and deposited by magnetron sputtering, and the measured reflectivity of optical elements is 45%. The 600 lp/inch copper grid backlit by laser produced plasma is imaging via Schwarzschild microscope on CCD. The spatial resolution is measured as 3 μm approximately in the field of 1.2 mm.

Paper Details

Date Published: 25 August 2010
PDF: 9 pages
Proc. SPIE 7801, Advances in Metrology for X-Ray and EUV Optics III, 78010G (25 August 2010); doi: 10.1117/12.860281
Show Author Affiliations
Xin Wang, Tongji Univ. (China)
Baozhong Mu, Tongji Univ. (China)
Yi Huang, Tongji Univ. (China)
Zirong Zhai, Tongji Univ. (China)
Shengzhen Yi, Tongji Univ. (China)
Li Jiang, Tongji Univ. (China)
Jingtao Zhu, Tongji Univ. (China)
Zhanshan Wang, Tongji Univ. (China)
Hongjie Liu, Research Ctr. of Laser Fusion, CAEP (China)
Leifeng Cao, Research Ctr. of Laser Fusion, CAEP (China)
Yuqiu Gu, Research Ctr. of Laser Fusion, CAEP (China)

Published in SPIE Proceedings Vol. 7801:
Advances in Metrology for X-Ray and EUV Optics III
Lahsen Assoufid; Peter Z. Takacs; Anand Krishna Asundi, Editor(s)

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