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Proceedings Paper

Comprehensive simulation of SEM images taking into account local and global electromagnetic fields
Author(s): Sergey Babin; Sergey S. Borisov; Hiroyuki Ito; Andrei Ivanchikov; Dmitri Matison; Vladimir Militsin; Makoto Suzuki
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Paper Abstract

We are reporting the development of a simulation tool with unique capabilities to comprehensively model an SEM signal. This includes electron scattering, charging, and detector settings, as well as modeling of the local and global electromagnetic fields and the electron trajectories in these fields. Experimental and simulated results were compared for SEM imaging of carbon nanofibers embedded into bulk material in the presence of significant charging, as well as for samples with applied potential on metal electrodes. The effect of the potentials applied to electrodes on the secondary emission was studied; the resulting SEM images were simulated. The image contrast depends strongly on the sign and the value of the potential. SEM imaging of nanofibers embedded into silicon dioxide resulted in the considerable change of the appeared dimensions of the fibers and as well as tone reversal when the beam voltage was varied. The results of the simulations are in agreement with experimental results.

Paper Details

Date Published: 8 June 2010
PDF: 6 pages
Proc. SPIE 7729, Scanning Microscopy 2010, 77290W (8 June 2010); doi: 10.1117/12.859951
Show Author Affiliations
Sergey Babin, Abeam Technologies (United States)
Sergey S. Borisov, Abeam Technologies (United States)
Hiroyuki Ito, Hitachi High-Technologies Corp. (Japan)
Andrei Ivanchikov, Abeam Technologies (United States)
Dmitri Matison, Abeam Technologies (United States)
Vladimir Militsin, Abeam Technologies (United States)
Makoto Suzuki, Hitachi High-Technologies Corp. (Japan)

Published in SPIE Proceedings Vol. 7729:
Scanning Microscopy 2010
Michael T. Postek; Dale E. Newbury; S. Frank Platek; David C. Joy, Editor(s)

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