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Proceedings Paper

At-wavelength optical metrology development at the ALS
Author(s): Sheng Yuan; Kenneth A. Goldberg; Valeriy V. Yashchuk; Richard Celestre; Iacopo Mochi; James Macdougall; Gregory Y. Morrison; Brian V. Smith; Edward E. Domning; Wayne R. McKinney; Tony Warwick
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Paper Abstract

Nano-focusing and brightness preservation for ever brighter synchrotron radiation and free electron laser beamlines require surface slope tolerances of x-ray optics on the order of 100 nrad. While the accuracy of fabrication and ex situ metrology of x-ray mirrors has improved over time, beamline in situ performance of the optics is often limited by application specific factors such as x-ray beam heat loading, temperature drift, alignment, vibration, etc. In the present work, we discuss the recent results from the Advanced Light Source developing high accuracy, in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad accuracy surface slope measurements with reflecting x-ray optics. The techniques will ultimately allow closed-loop feedback systems to be implemented for x-ray nano-focusing. In addition, we present a dedicated metrology beamline endstation, applicable to a wide range of in situ metrology and test experiments. The design and performance of a bendable Kirkpatrick-Baez (KB) mirror with active temperature stabilization will also be presented. The mirror is currently used to study, refine, and optimize in situ mirror alignment, bending and metrology methods essential for nano-focusing application.

Paper Details

Date Published: 28 August 2010
PDF: 13 pages
Proc. SPIE 7801, Advances in Metrology for X-Ray and EUV Optics III, 78010D (28 August 2010); doi: 10.1117/12.859946
Show Author Affiliations
Sheng Yuan, Lawrence Berkeley National Lab. (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Valeriy V. Yashchuk, Lawrence Berkeley National Lab. (United States)
Richard Celestre, Lawrence Berkeley National Lab. (United States)
Iacopo Mochi, Lawrence Berkeley National Lab. (United States)
James Macdougall, Lawrence Berkeley National Lab. (United States)
Gregory Y. Morrison, Lawrence Berkeley National Lab. (United States)
Brian V. Smith, Lawrence Berkeley National Lab. (United States)
Edward E. Domning, Lawrence Berkeley National Lab. (United States)
Wayne R. McKinney, Lawrence Berkeley National Lab. (United States)
Tony Warwick, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 7801:
Advances in Metrology for X-Ray and EUV Optics III
Lahsen Assoufid; Peter Z. Takacs; Anand Krishna Asundi, Editor(s)

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