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Proceedings Paper

Developmental long trace profiler using optimally aligned mirror-based pentaprism
Author(s): Samuel K. Barber; Gregory Y. Morrison; Valeriy V. Yashchuk; Mikhail V. Gubarev; Ralf D. Geckeler; Jana Buchheim; Frank Siewert; Thomas Zeschke
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Paper Abstract

A low-budget surface slope measuring instrument, the Developmental Long Trace Profiler (DLTP), was recently brought into operation at the Advanced Light Source Optical Metrology Laboratory [Nucl. Instr. and Meth. A 616, 212- 223 (2010)]. The instrument is based on a precisely calibrated autocollimator and a movable pentaprism. The capability of the DLTP to achieve sub-microradian surface slope metrology has been verified via cross-comparison measurements with other high-performance slope measuring instruments when measuring the same high-quality test optics. In the present work, a further improvement of the DLTP is achieved by replacing the existing bulk pentaprism with a specially designed mirror based pentaprism. A mirror based pentaprism offers the possibility to eliminate systematic errors introduced by inhomogeneity of the optical material and fabrication imperfections of a bulk pentaprism. We provide the details of the mirror based pentaprism design and describe an original experimental procedure for precision mutual alignment of the mirrors. The algorithm of the alignment procedure and its efficiency are verified with rigorous ray tracing simulations. Results of measurements of a spherically curved test mirror and a flat test mirror using the original bulk pentaprism are compared with measurements using the new mirror based pentaprism, demonstrating the improved performance.

Paper Details

Date Published: 1 September 2010
PDF: 12 pages
Proc. SPIE 7801, Advances in Metrology for X-Ray and EUV Optics III, 780103 (1 September 2010); doi: 10.1117/12.859925
Show Author Affiliations
Samuel K. Barber, Lawrence Berkeley National Lab. (United States)
Gregory Y. Morrison, Lawrence Berkeley National Lab. (United States)
Valeriy V. Yashchuk, Lawrence Berkeley National Lab. (United States)
Mikhail V. Gubarev, NASA Marshall Space Flight Ctr. (United States)
Ralf D. Geckeler, Physikalisch-Technische Bundesanstalt (Germany)
Jana Buchheim, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
Frank Siewert, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
Thomas Zeschke, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)

Published in SPIE Proceedings Vol. 7801:
Advances in Metrology for X-Ray and EUV Optics III
Lahsen Assoufid; Peter Z. Takacs; Anand Krishna Asundi, Editor(s)

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