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Proceedings Paper

Compact extreme ultraviolet source by use of a discharge-produced potassium plasma for surface morphology application
Author(s): Hiromitsu Terauchi; Mami Yamaguchi; Keisuke Kikuchi; Takamitsu Otsuka; Takeshi Higashiguchi; Noboru Yugami; Toyohiko Yatagai; Padraig Dunne; Gerry O'Sullivan
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Paper Abstract

We have reported a discharge-produced plasma extreme ultraviolet source based on a pure potassium vapor. Potassium ions produced strong broadband emission around 40 nm with a bandwidth of 8 nm [full width at halfmaximum (FWHM)]. The current-voltage characteristics of discharge suggest that the source operates in a hollow cathode mode. By comparison with atomic structure calculations, the broadband emission is found to be primarily due to 3d-3p transitions in potassium ions ranging from K 2+ to K4+.

Paper Details

Date Published: 25 August 2010
PDF: 10 pages
Proc. SPIE 7802, Advances in X-Ray/EUV Optics and Components V, 78020T (25 August 2010); doi: 10.1117/12.858603
Show Author Affiliations
Hiromitsu Terauchi, Utsunomiya Univ. (Japan)
Mami Yamaguchi, Utsunomiya Univ. (Japan)
Keisuke Kikuchi, Utsunomiya Univ. (Japan)
Takamitsu Otsuka, Utsunomiya Univ. (Japan)
Takeshi Higashiguchi, Utsunomiya Univ. (Japan)
Japan Science and Technology Agency (Japan)
Noboru Yugami, Utsunomiya Univ. (Japan)
Japan Science and Technology Agency (Japan)
Toyohiko Yatagai, Utsunomiya Univ. (Japan)
Padraig Dunne, Univ. College Dublin (Ireland)
Gerry O'Sullivan, Univ. College Dublin (Ireland)


Published in SPIE Proceedings Vol. 7802:
Advances in X-Ray/EUV Optics and Components V
Shunji Goto; Ali M. Khounsary; Christian Morawe, Editor(s)

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