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Proceedings Paper

Micro-imaging performance of multilayers used as monochromators for coherent hard x-ray synchrotron radiation
Author(s): A. Rack; T. Weitkamp; M. Riotte; T. Rack; R. Dietsch; T. Holz; M. Krämer; F. Siewert; M. Meduna; Ch. Morawe; P. Cloetens; E. Ziegler
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Paper Abstract

We present a systematic study in which multilayers of different composition (W/Si, Mo/Si, Pd/B4C), periodicity (from 2.5 to 5.5 nm), and numbers of layers have been characterised. Particularly, we investigated the intrinsic quality (roughness and reflectivity) as well as the performance (flatness and coherence of the outgoing beam) as a monochromator for synchrotron radiation hard X-ray micro-imaging. The results indicate that the material composition is the dominating factor for the performance. This is of high importance for synchrotron-based hard X-ray imaging which has become a widely applied tool for probing the microstructure of bulk samples. The high spatial resolution and different contrast modalities available here strongly depend on using coherent beams from highly brilliant sources. In order to satisfy the demand for a high flux of quasi-monochromatic photons, multilayer-coated mirrors are commonly used as monochromators. Their properties present a good tradeoff between spectral bandwidth and photon flux density. Since the photon flux density at the sample position is higher than with standard crystal monochromators, better spatial resolution can be reached. This comes at the cost of reduced energy resolution and stronger non-uniformities in the incoming beam profile. By helping scientists and engineers specify the design parameters of multilayer monochromators, our results can contribute to a better exploitation of the advantages of multilayer monochromators over crystal-based devices; i.e., larger spectral bandwidth and high photon flux density for X-ray imaging.

Paper Details

Date Published: 27 August 2010
PDF: 7 pages
Proc. SPIE 7802, Advances in X-Ray/EUV Optics and Components V, 78020M (27 August 2010); doi: 10.1117/12.858355
Show Author Affiliations
A. Rack, European Synchrotron Radiation Facility (France)
T. Weitkamp, European Synchrotron Radiation Facility (France)
M. Riotte, Karlsruher Institut für Technologie (Germany)
T. Rack, Karlsruher Institut für Technologie (Germany)
R. Dietsch, AXO Dresden GmbH (Germany)
T. Holz, AXO Dresden GmbH (Germany)
M. Krämer, AXO Dresden GmbH (Germany)
F. Siewert, Helmholtz Zentrum Berlin (Germany)
M. Meduna, Masaryk Univ. (Czech Republic)
Ch. Morawe, European Synchrotron Radiation Facility (France)
P. Cloetens, European Synchrotron Radiation Facility (France)
E. Ziegler, European Synchrotron Radiation Facility (France)

Published in SPIE Proceedings Vol. 7802:
Advances in X-Ray/EUV Optics and Components V
Shunji Goto; Ali M. Khounsary; Christian Morawe, Editor(s)

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