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Proceedings Paper

A simple null-field ellipsometric imaging system (NEIS) for in-situ monitoring of EUV-induced deposition on EUV optics
Author(s): Rashi Garg; Nadir Faradzhev; Shannon Hill; Lee Richter; P. S. Shaw; R. Vest; T. B. Lucatorto
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Paper Abstract

We describe a null-field ellipsometric imaging system (NEIS) that provides for the real-time imaging of carbon deposition profiles on extreme-ultraviolet (EUV) optics in a vacuum system. NEIS has been demonstrated at NIST on a small chamber that is used for EUV optics lifetime testing. The system provides images of carbon deposition spots with sub-nanometer resolution thickness measurements that maintain good agreement with those from ex-situ spectral ellipsometry (SE) and x-ray photoelectron spectroscopy (XPS). The system will be implemented on several synchrotron beamlines for real-time monitoring of carbon film growth on optics during EUV irradiation.

Paper Details

Date Published: 22 March 2010
PDF: 6 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76361Z (22 March 2010); doi: 10.1117/12.855967
Show Author Affiliations
Rashi Garg, Univ. at Albany (United States)
Nadir Faradzhev, Rutgers, The State Univ. of New Jersey (United States)
Shannon Hill, National Institute of Standards and Technology (United States)
Lee Richter, National Institute of Standards and Technology (United States)
P. S. Shaw, National Institute of Standards and Technology (United States)
R. Vest, National Institute of Standards and Technology (United States)
T. B. Lucatorto, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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