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Proceedings Paper

A first order analysis of scatterometry sensitivity for NIL process
Author(s): Takahiro Miyakawa; Koichi Sentoku; Kazuhiro Sato; Hideki Ina
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Paper Abstract

In this paper the first order analysis of the scatterometry sensitivity up to 45nm HP resin pattern and beyond by using RCWA (Rigorous Coupled Wave-analysis) simulation is described. A criterion, defined as the sum of the absolute difference of the reflectivity values between the nominal and varied conditions thorough the spectrum, is introduced. The criterion of this analysis is a kind of quantification of the sensitivity comparing with 65 nm HP resist pattern of ArF immersion process. Furthermore, the simulated result in this analysis can be used to discuss the extendibility of scatterometry.

Paper Details

Date Published: 2 April 2010
PDF: 7 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 763721 (2 April 2010); doi: 10.1117/12.855872
Show Author Affiliations
Takahiro Miyakawa, Canon Inc. (Japan)
Koichi Sentoku, Canon Inc. (Japan)
Kazuhiro Sato, Canon Inc. (Japan)
Hideki Ina, Canon Inc. (Japan)


Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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