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Proceedings Paper

Two-photon sensitized recording materials for multilayer optical disk
Author(s): M. Akiba; E. Goto-Takahashi; H. Takizawa; T. Sasaki; H. Mochizuki; T. Mikami; T. Kitahara
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Paper Abstract

Two types of novel two-photon sensitized recording material writable at 405 nm and 522nm were developed. The fluorescent dye generation type (F-type) material consists of at least two-photon absorption dye (TPAD) and fluorescent dye precursor (FDP), which is non-fluorescent before two-photon recording and fluorescent after two-photon recording due to fluorescent dye generation. The fluorescence quench type (Q-type) material, on the other hand, consists of at least TPAD, fluorescent dye (FD) and fluorescent quencher precursor (QP), which is fluorescent before two-photon recording and the fluorescence intensity is reduced after two-photon recording at the recorded spot due to fluorescent quencher generation. Both types of material showed quadratic dependency of recording light intensity at 522 and 405 nm. A twenty-layer two-photon recording media was fabricated with the Q-type material, and two-photon recording and onephoton fluorescent signal readout was successfully conducted.

Paper Details

Date Published: 8 June 2010
PDF: 6 pages
Proc. SPIE 7730, Optical Data Storage 2010, 773018 (8 June 2010); doi: 10.1117/12.855795
Show Author Affiliations
M. Akiba, FUJIFILM Corp. (Japan)
E. Goto-Takahashi, FUJIFILM Corp. (Japan)
H. Takizawa, FUJIFILM Corp. (Japan)
T. Sasaki, FUJIFILM Corp. (Japan)
H. Mochizuki, FUJIFILM Corp. (Japan)
T. Mikami, FUJIFILM Corp. (Japan)
T. Kitahara, FUJIFILM Corp. (Japan)


Published in SPIE Proceedings Vol. 7730:
Optical Data Storage 2010

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