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Proceedings Paper

Simulation and in-plane movement characterization of 2D MEMS platform
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Paper Abstract

In the paper, we present design, numerical modeling and measurement results of silicon X-Y movable platform dedicated for miniaturized microinterferometric sensor based on grating interferometry. The structure fabricated with double-side DRIE of SOI wafer, provides independent movement in x and y directions in the distance of ±35 μm with driving voltage upto 150 V . The presented microstructure has 160 nm deep diffraction grating integrated on its surface. Small, static movement of the structure, with nanometric resolution, in direction perpendicular to the grating lines, provides phase shifting of two conjugated interfering beams. Optimization of the structure driving in order to achieve maximum movement resolution is covered in details. The in-plane displacements of the structure is characterized with common correlation method that needs no markers imprinted on its surface. Resolution of the method depends on the microscopic imaging system. The performance of the method is presented on the example of various steering modes of the platform, covering parabolic and linear displacement(voltage) characteristics.

Paper Details

Date Published: 14 May 2010
PDF: 8 pages
Proc. SPIE 7718, Optical Micro- and Nanometrology III, 77180H (14 May 2010); doi: 10.1117/12.855747
Show Author Affiliations
Jerzy Krężel, Institute of Micromechanics and Photonics (Poland)
Karolina Laszczyk, FEMTO-ST Institute, UMR CNRS (France)
Sylwester Bargiel, FEMTO-ST Institute, UMR CNRS (France)
Christophe Gorecki, FEMTO-ST Institute, UMR CNRS (France)
Małgorzata Kujawińska, Institute of Micromechanics and Photonics (Poland)
Olivier Parriaux, Lab. Hubert Curien, UMR CNRS (France)
Svetlen Tonchev, Institute of Solid State Physics (Bulgaria)


Published in SPIE Proceedings Vol. 7718:
Optical Micro- and Nanometrology III
Christophe Gorecki; Anand Krishna Asundi; Wolfgang Osten, Editor(s)

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