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Proceedings Paper

Ultrafast Bessel beams for high aspect ratio taper free micromachining of glass
Author(s): M. K. Bhuyan; F. Courvoisier; P.-A. Lacourt; M. Jacquot; L. Furfaro; M. J. Withford; J. M. Dudley
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Paper Abstract

Although ultrafast lasers have demonstrated much success in structuring and ablating dielectrics on the micrometer scale and below, high aspect ratio structuring remains a challenge. Specifically, microfluidics or lab-on-chip DNA sequencing systems require high aspect ratio sub-10 μm wide channels with no taper. Micro-dicing also requires machining with vertical walls. Backside water assisted ultrafast laser processing with Gaussian beams allows the production of high aspect ratio microchannels but requires sub-micron sample positioning and precise control of translation velocity. In this context, we propose a new approach based on Bessel beams that exhibit a focal range exceeding the Rayleigh range by over one order of magnitude. An SLM-based setup allows us to produce a Bessel beam with central core diameter of 1.5 μm FWHM extending over a longitudinal range of 150 μm. A working window in the parameter space has been identified that allows the reliable production of high aspect ratio taper-free microchannels without sample translation. We report a systematic investigation of the damage morphology dependence on focusing geometry and energy per pulse.

Paper Details

Date Published: 5 June 2010
PDF: 8 pages
Proc. SPIE 7728, Nonlinear Optics and Applications IV, 77281V (5 June 2010); doi: 10.1117/12.854767
Show Author Affiliations
M. K. Bhuyan, FEMTO-ST Institute, CNRS, Univ. de Franche-Comté (France)
F. Courvoisier, FEMTO-ST Institute, CNRS, Univ. de Franche-Comté (France)
P.-A. Lacourt, FEMTO-ST Institute, CNRS, Univ. de Franche-Comté (France)
M. Jacquot, FEMTO-ST Institute, CNRS, Univ. de Franche-Comté (France)
L. Furfaro, FEMTO-ST Institute, CNRS, Univ. de Franche-Comté (France)
M. J. Withford, Macquarie Univ. (Australia)
J. M. Dudley, FEMTO-ST Institute, CNRS, Univ. de Franche-Comté (France)


Published in SPIE Proceedings Vol. 7728:
Nonlinear Optics and Applications IV
Benjamin J. Eggleton; Alexander Luis Gaeta; Neil G. R. Broderick, Editor(s)

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