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Proceedings Paper

Formation of carbonic nanostructures using PECVD and glow-discharge plasma at direct current
Author(s): D. G. Gromov; S. A. Gavrilov; S. V. Dubkov
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Paper Abstract

In this research the process of formation carbonic nanostructures using low temperatures was studied. Nanostructures were formed using PECVD and glow-discharge plasma. The research was carried out at temperature range between 300°C - 700°C. The influence of Ni catalyst thickness and concentration of carbon-containing component in vapour phase on the structure of carbonic deposit was studied. Consequently we attained productive growth of both the homogeneous vertical nanotubes and graphene flakes array at low temperature (350°C). Electrophysical features of obtained structures were examined.

Paper Details

Date Published: 26 February 2010
PDF: 8 pages
Proc. SPIE 7521, International Conference on Micro- and Nano-Electronics 2009, 75210Y (26 February 2010); doi: 10.1117/12.854748
Show Author Affiliations
D. G. Gromov, Moscow Institute of Electronic Technology (Russian Federation)
S. A. Gavrilov, Moscow Institute of Electronic Technology (Russian Federation)
S. V. Dubkov, Moscow Institute of Electronic Technology (Russian Federation)


Published in SPIE Proceedings Vol. 7521:
International Conference on Micro- and Nano-Electronics 2009
Kamil A. Valiev; Alexander A. Orlikovsky, Editor(s)

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