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Proceedings Paper

Smart technology for blazed multilevel gratings in resonance domain
Author(s): M. Oliva; T. Benkenstein; J. Dunkel; T. Harzendorf; A. Matthes; D. Michaelis; U. D. Zeitner
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Paper Abstract

The design and the fabrication of a multilevel blazed grating in resonance domain for first order high efficiency applications are presented. The design shows that a 3 phase level grating is sufficient to achieve efficiency of 90% in the minus first diffraction order. The standard technology for the fabrication of multilevel grating consists in multistep electron beam lithography and reactive ion beam etching of the grating profile into the fused silica substrate. Typical fabrication errors of this technology approach, e.g. misalignment, reduce the theoretical reachable efficiency of the grating. Two new technological approaches were investigated to avoid these typical fabrication errors and to improve the multi level fabrication process. The designed grating has been fabricated by three different technological solutions and the geometrical characterization as well as the diffraction performance are presented and discussed.

Paper Details

Date Published: 14 May 2010
PDF: 10 pages
Proc. SPIE 7716, Micro-Optics 2010, 77161L (14 May 2010); doi: 10.1117/12.854587
Show Author Affiliations
M. Oliva, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
T. Benkenstein, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
J. Dunkel, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
T. Harzendorf, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
A. Matthes, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
D. Michaelis, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
U. D. Zeitner, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)


Published in SPIE Proceedings Vol. 7716:
Micro-Optics 2010
Hugo Thienpont; Peter Van Daele; Jürgen Mohr; Hans Zappe, Editor(s)

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