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Proceedings Paper

Manufacturing of diffraction-quality optical elements for high-resolution optical systems
Author(s): N. I. Chkhalo; A. E. Pestov; N. N. Salashchenko; M. N. Toropov
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Paper Abstract

The paper is devoted to the fundamental problems of manufacturing and testing substrates with fine precision for multilayer mirrors which surface shape, as a rule, is an aspherical one and that should be made with a sub-nanometer precision, to characterizing multilayer covers deposited onto these substrates and also to measuring with the subnanometer accuracy the wave-front aberrations of high-aperture optical projective objectives. A particular attention has been given to interferometers with a diffraction reference wave. Last experimental results on aberrations of the reference spherical wave of a source based on a single mode tipped fiber with a sub-wave exit aperture are presented. The application of this interferometer for characterizing aspherical convex optical surfaces and wave-front aberrations of optical systems is illustrated. Resent results on correcting the optical element surfaces are presented. Some peculiarities of the deposition technology as applied to the mirrors with ultra-high precision surface shape are discussed.

Paper Details

Date Published: 26 February 2010
PDF: 12 pages
Proc. SPIE 7521, International Conference on Micro- and Nano-Electronics 2009, 752104 (26 February 2010); doi: 10.1117/12.854325
Show Author Affiliations
N. I. Chkhalo, Institute for Physics of Microstructures (Russian Federation)
A. E. Pestov, Institute for Physics of Microstructures (Russian Federation)
N. N. Salashchenko, Institute for Physics of Microstructures (Russian Federation)
M. N. Toropov, Institute for Physics of Microstructures (Russian Federation)


Published in SPIE Proceedings Vol. 7521:
International Conference on Micro- and Nano-Electronics 2009
Kamil A. Valiev; Alexander A. Orlikovsky, Editor(s)

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