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Proceedings Paper

Level set method for microfabrication simulations
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Paper Abstract

The article describes application of Level Set method for two different microfabrication processes. First is shape evolution of during reflow of the glass structure. Investigated problem were approximated by viscous flow of material thus kinetics of the process were known from physical model. Second problem is isotropic wet etching of silicon. Which is much more complicated because dynamics of the shape evolution is strongly coupled with time and geometry shapes history. In etching simulations Level Set method is coupled with Finite Element Method (FEM) that is used for calculation of etching acid concentration that determine geometry evolution of the structure. The problem arising from working with FEM with time varying boundaries was solved with the use of the dynamic mesh technique employing the Level Set formalism of higher dimensional function for geometry description. Isotropic etching was investigated in context of mico-lenses fabrication. Model was compared with experimental data obtained in etching of the silicon moulds used for micro-lenses fabrication.

Paper Details

Date Published: 14 May 2010
PDF: 9 pages
Proc. SPIE 7716, Micro-Optics 2010, 77161W (14 May 2010); doi: 10.1117/12.853836
Show Author Affiliations
Maciej Baranski, Univ. of Warsaw (Poland)
Rafal Kasztelanic, Univ. of Warsaw (Poland)
Jorge Albero, FEMTO-ST (France)
Lukasz Nieradko, FEMTO-ST (France)
Wroclaw Research Centre EIT+ ltd. (Poland)
Christophe Gorecki, FEMTO-ST (France)


Published in SPIE Proceedings Vol. 7716:
Micro-Optics 2010
Hugo Thienpont; Peter Van Daele; Jürgen Mohr; Hans Zappe, Editor(s)

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